SUSCRYPP

Completed

The objective of this project is to achieve high surface area silicon nanostructures for next generations of active and passive components with high integration density. The proposed route for the realization of nanostructures is to use masks based on inexpensive homopolymer mixtures and to transfer nanopatterns to silicon by plasma cryogravure.

Project benefits

Thèse : 1

Publication scientifique : 27

Procédé : 6

Rapport final : 3

Emplois crées : 6

Thèse : 2

People involved in the project

Project leader

Member partner

Information of the project

Start of the project on28 / 05 / 2024 | End of project on28 / 05 / 2024


Strategic business lines

Électronique : matériaux, composants et sous-systèmes


Referent of the project

Sébastien DESPLOBAIN
Chargé de projets innovants

07 86 53 38 74

sebastien.desplobain@s2e2.fr

Centre-Val de Loire