JA-SUR

In the context of nanolithography, producing ordered patterns below 10 nm with a low density of defects on a large scale (usually cm), compatible with industry expectations, remains an unmet challenge. The objective of the project is to produce nano-designs on a large scale below 10 nm with low defect density using a robust self-assembly method. To achieve this, the proposed concept is first of all to pre-assemble polymers suitably functionalized in rigid Janus nanorods with a high aspect ratio.

There are no benefits for this project at this time