In the context of nanolithography, producing ordered patterns below 10 nm with a low density of defects on a large scale (usually cm), compatible with industry expectations, remains an unmet challenge. The objective of the project is to produce nano-designs on a large scale below 10 nm with low defect density using a robust self-assembly method. To achieve this, the proposed concept is first of all to pre-assemble polymers suitably functionalized in rigid Janus nanorods with a high aspect ratio.
There are no benefits for this project at this time
Project leader
No member partner
LABORATOIRE IMMM
INSTITUT PARISIEN DE CHIMIE MOLÉCULAIRE (IPCM)
Start of the project on16 / 02 / 2025
Strategic business lines
Électronique : matériaux, composants et sous-systèmes
Referent of the project
07 86 53 38 70
daniel.meley@s2e2.fr
Centre-Val de Loire