JA-SUR

Accepted

In the context of nanolithography, producing ordered patterns below 10 nm with a low density of defects on a large scale (usually cm), compatible with industry expectations, remains an unmet challenge. The objective of the project is to produce nano-designs on a large scale below 10 nm with low defect density using a robust self-assembly method. To achieve this, the proposed concept is first of all to pre-assemble polymers suitably functionalized in rigid Janus nanorods with a high aspect ratio.

Project benefits

There are no benefits for this project at this time

People involved in the project

Project leader

No member partner

INSTITUT PARISIEN DE CHIMIE MOLÉCULAIRE (IPCM)

LABORATOIRE IMMM

Strategic business lines

Matériaux et composants pour l'électronique


Referent of the project

Florentin BORÉ
Chargé de projets innovants

06 66 39 55 43

florentin.bore-ext@st.com

Centre-Val de Loire