In progress

The objective of this project is to identify new dielectric materials and to develop the associated deposition processes for the realization of very high quality capacity. These materials must have low dielectric losses and replace more traditional materials such as silicon oxide. These capacitors are intended to be integrated into filters (high-pass, low-pass, etc.) for the needs of 5G and IoT (IPD, Integrated Passive Devices). The deposition technique explored during this project is ALD (Atomic Layer Deposition). This method makes it possible to control the nature of the deposit on an atomic scale. A complete study of the electrodes, dielectric and associated interfaces can be carried out to optimize the characteristics of the capacitors.

Project benefits

Emplois crées : 1

Emplois crées : 1

People involved in the project

Project leader

Member partner

Strategic business lines

Matériaux et composants pour l'électronique

Referent of the project

Chargé de projets innovants

07 86 53 38 74

Centre-Val de Loire